Tender notice
Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) System
Notice details
- Published
- Category
- goods
- Buyer region
- South West
- Source
- View official notice
Public buyer
Public buyer
University of BristolTender value£350,000
- Planned startAs published in the notice
- Planned endAs published in the notice
Work description
We want to acquire an Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) system. The system should be able to etch the surface of samples utilising RIE physical-chemical mechanism. The System will be located in a class 10000 cleanroom space and will be operated by students and technical staff. The System should integrate smoothly with the existing facilities without any prejudice for the normal operation. The main purpose for the System is the definition of silicon and silicon-related waveguide structures for integrated quantum photonics applications. Such structures are typically defined on 6-inch silicon-on-insulator wafers with 220nm-thick crystalline silicon films. The system should excel at verticality (