UV Laser for Interferometric Lithography

Description

An ultra-violet (UV) laser is required for nanolithography. In particular, the laser will be used to conduct interferometric lithography. Our equipment utilises a Lloyd's mirror interferometer, in which half of the laser beam is directed onto a sample, and the other half is directed onto a mirror from where it is reflected onto the sample to interfere with the first half of the beam Additional information: All tender documents, tender related enquiries & any returns must be conducted through the In-tend site via the link provided above.

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